A novel approach to determine decorrelation effect in a dual-beam electronic speckle pattern interferometer
نویسنده
چکیده
A lIOftIappr_u 10 detma_ ~&. effed ill ..... ~ IIt:am dt:ctroaie sp«klt: ,.nen iIIterferometer. An intrinsic decorrelation effect in a dual-beam ESPI system for contouring application is quantified by sUnfle image processing tcchmques i.ncorpo~ting experimenta data of speckle patterns. Pracllcal limits for the range of application on contouring an object are also considered from the point of view of automatic fringe analysis. An acceptable degue of decor· relation due to the tilt of illuminating beams has been established.
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تاریخ انتشار 2011